Paper | Title | Page |
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WEP025 | A Study of the Gain of Microchannel Plates in the Ionization Profile Monitors at Fermilab | 405 |
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Funding: This work was produced by Fermi Research Alliance, LLC under Contract No. DE-AC02-07CH11359 with the U.S. Department of Energy. One of the on-going issues with the use of microchannel plates (MCP) in the ionization profile monitors (IPM) at Fermilab is the significant decrease in gain over time. There are several possible issues that can cause this. Historically, the assumption has been that this is aging, where the secondary emission yield (SEY) of the pore surface changes after some amount of extracted charge. Recent literature searches have brought to light the possibility that this is an initial ’scrubbing’ effect whereby adsorbed gasses are removed from the MCP pores by the removal of charge from the MCP. This paper discusses the results of studies conducted on the IPMs in the Main Injector at Fermilab. |
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Poster WEP025 [7.408 MB] | ||
DOI • | reference for this paper ※ doi:10.18429/JACoW-IBIC2023-WEP025 | |
About • | Received ※ 08 September 2023 — Revised ※ 10 September 2023 — Accepted ※ 11 September 2023 — Issue date ※ 18 September 2023 | |
Cite • | reference for this paper using ※ BibTeX, ※ LaTeX, ※ Text/Word, ※ RIS, ※ EndNote (xml) | |