Yue, J.H. Cao, J.S. Du, Y.Y. He, J. Liu, F. Liu, X.Y. Liu, Z. Lu, Y.H. Ma, H.Z. Sui, Y.F. Wang, A.X. Wang, L. Wei, S.J. Xu, T.G. Ye, Q. Yu, L. Zhang, W. Zhao, Y. Zhu, D.C. JACoW Publishing Geneva, Switzerland HEPS is a fourth generation light source which has horizontal emittance around 34pm.rad to gain the high brilliance photon beam, this ultra-low emittance brings many engineering challenges for beam instrumentation. The resolution of the beam position measurement and the beam size measurement is need to reach sub-micro meter. The large current and multi-bunches need bunch by bunch feedback system to cure instabilities. This paper will present an overview of beam instrumentation